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    News: SyLMAND Beamline/Facility

    Posted on March 13, 2017
    SyLMAND is now offering both X-ray and UV lithography.  UV laser patterning of resist is usually used at SyLMAND for primary patterning of X-ray masks.  The UV patterning can also be used as a stand alone technology for patterning of thn films and rapid prototyping using UV sensitive photoresists.  Several different resist technologies are available including SU-8 negative resist, AZ1500 series positive resist and and Ma-N 1400 series negative photoresist suitable for lift-off.


SyLMAND is a Beamline/Facility that utilizes X-ray and UV lithography to fabricate micro structured devices.

The Synchrotron Laboratory for Micro and Nano Devices (SyLMAND) beamline is Canada’s only x-ray lithography beamline and is located at the Canadian Light Source (CLS) in Saskatoon, Canada. The beamline and supporting labs are housed in a Class 10 000 cleanroom. SyLMAND offers complete X-ray and UV lithography processing capabilities and advanced metrology to academic and industrial users. SyLMAND employs two full-time scientists with expertise in processing technologies and applications including RF MEMS, x-ray optics, biomedical device fabrication, microfluidics, and devices for analytical spectroscopy.

 

 

 


  • SyLMAND Status:
    Closed due to COVID-19
  • Call for Proposals
    Closed, deadline was February 26, 2020
  • Storage Ring Status >>
 

List of Publications »

  • Morhart, Tyler A.; Tu, Kaiyang; Read, Stuart; Rosendahl, Scott M; Wells, Garth et al. (2021). Surface Enhanced Infrared Spectroelectrochemistry using a Microband El .... Canadian Journal of Chemistry . 10.1139/cjc-2021-0183.
  • Joly, Maxime; Deng, Tianyang; Morhart, Tyler A.; Wells, Garth; Achenbach, Sven et al. (2021). Scanning Aperture Approach for Spatially Selective ATR-FTIR Spectrosco .... Analytical Chemistry 93(42) . 10.1021/acs.analchem.1c01614.
  • Tu, Kaiyang; Morhart, Tyler A.; Read, Stuart T.; Rosendahl, Scott M.; Burgess, Ian J. et al. (2021). Probing Heterogeneity in Attenuated Total Reflection Surface-Enhanced .... Applied Spectroscopy 75(9) , 000370282110058. 10.1177/00037028211005817.