News: SyLMAND Beamline/FacilityPosted on March 13, 2017
SyLMAND is now offering both X-ray and UV lithography. UV laser patterning of resist is usually used at SyLMAND for primary patterning of X-ray masks. The UV patterning can also be used as a stand alone technology for patterning of thn films and rapid prototyping using UV sensitive photoresists. Several different resist technologies are available including SU-8 negative resist, AZ1500 series positive resist and and Ma-N 1400 series negative photoresist suitable for lift-off.
SyLMAND is a Beamline/Facility that utilizes X-ray and UV lithography to fabricate micro structured devices.
The Synchrotron Laboratory for Micro and Nano Devices (SyLMAND) beamline is Canada’s only x-ray lithography beamline and is located at the Canadian Light Source (CLS) in Saskatoon, Canada. The beamline and supporting labs are housed in a Class 10 000 cleanroom. SyLMAND offers complete X-ray and UV lithography processing capabilities and advanced metrology to academic and industrial users. SyLMAND employs two full-time scientists with expertise in processing technologies and applications including RF MEMS, x-ray optics, biomedical device fabrication, microfluidics, and devices for analytical spectroscopy.
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- Wells; Garth; Achenbach; Sven; Klymyshyn et al. (2019). High-Aspect-Ratio Micropatterning Capabilities into Thick Resist Layer .... Synchrotron Radiation News 32(4) , 44-47. 10.1080/08940886.2019.1634438.
- Mazhar; Waqas; Klymyshyn; David M.; Wells et al. (2019). Low-Profile Artificial Grid Dielectric Resonator Antenna Arrays for mm .... IEEE Transactions on Antennas and Propagation 67(7) , 1-1. 10.1109/tap.2019.2907610.