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    News: SyLMAND Beamline/Facility

    Posted on March 13, 2017
    SyLMAND is now offering both X-ray and UV lithography.  UV laser patterning of resist is usually used at SyLMAND for primary patterning of X-ray masks.  The UV patterning can also be used as a stand alone technology for patterning of thn films and rapid prototyping using UV sensitive photoresists.  Several different resist technologies are available including SU-8 negative resist, AZ1500 series positive resist and and Ma-N 1400 series negative photoresist suitable for lift-off.


SyLMAND is a Beamline/Facility that utilizes X-ray and UV lithography to fabricate micro structured devices.

The Synchrotron Laboratory for Micro and Nano Devices (SyLMAND) beamline is Canada’s only x-ray lithography beamline and is located at the Canadian Light Source (CLS) in Saskatoon, Canada. The beamline and supporting labs are housed in a Class 10 000 cleanroom. SyLMAND offers complete X-ray and UV lithography processing capabilities and advanced metrology to academic and industrial users. SyLMAND employs two full-time scientists with expertise in processing technologies and applications including RF MEMS, x-ray optics, biomedical device fabrication, microfluidics, and devices for analytical spectroscopy.

 

 

 


 

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List of Publications »

  • Burgess, Ian J.; Morhart, Tyler A.; Flaman, Grace T.; Boyle, Nicole D.; Deng, Tiangyang et al. (2025). Into the Groove: Analytical Applications of ATR-FTIR Microstructured Internal Reflection Elements. Analytical Chemistry . 10.1021/acs.analchem.4c05431.
  • Farahinia, Alireza; Khani, Milad; Morhart, Tyler A.; Wells, Garth; Badea, Ildiko et al. (2024). A Novel Size-Based Centrifugal Microfluidic Design to Enrich and Magnetically Isolate Circulating Tumor Cells from Blood Cells through Biocompatible Magnetite–Arginine Nanoparticles. Sensors 24(18) , 6031. 10.3390/s24186031.
  • Lei, Lei; Achenbach, Sven; Wells, Garth; Zhang, Hongbo; Zhang, Wenjun et al. (2024). A Novel Device for Micro-Droplets Generation Based on the Stepwise Membrane Emulsification Principle. Micromachines 15(9) , 1118. 10.3390/mi15091118.

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