News: SyLMAND Beamline/FacilityPosted on March 13, 2017
SyLMAND is now offering both X-ray and UV lithography. UV laser patterning of resist is usually used at SyLMAND for primary patterning of X-ray masks. The UV patterning can also be used as a stand alone technology for patterning of thn films and rapid prototyping using UV sensitive photoresists. Several different resist technologies are available including SU-8 negative resist, AZ1500 series positive resist and and Ma-N 1400 series negative photoresist suitable for lift-off.
SyLMAND is a Beamline/Facility that utilizes X-ray and UV lithography to fabricate micro structured devices.
The Synchrotron Laboratory for Micro and Nano Devices (SyLMAND) beamline is Canada’s only x-ray lithography beamline and is located at the Canadian Light Source (CLS) in Saskatoon, Canada. The beamline and supporting labs are housed in a Class 10 000 cleanroom. SyLMAND offers complete X-ray and UV lithography processing capabilities and advanced metrology to academic and industrial users. SyLMAND employs two full-time scientists with expertise in processing technologies and applications including RF MEMS, x-ray optics, biomedical device fabrication, microfluidics, and devices for analytical spectroscopy.
- Mazhar, Waqas; Klymyshyn, David M; Achenbach, Sven; Qureshi, Aqeel Ahmed; Wells, Garth et al. (2020). On the fabrication of thin-film artificial metal grid resonator antenn .... Journal of Micromechanics and Microengineering . 10.1088/1361-6439/ab6dbd.
- Wells, Garth; Achenbach, Sven; Klymyshyn, David; Jacobs, Michael; Mazhar, Waqas et al. (2019). High-Aspect-Ratio Micropatterning Capabilities into Thick Resist Layer .... Synchrotron Radiation News 32(4) , 44-47. 10.1080/08940886.2019.1634438.
- Mazhar, Waqas; Klymyshyn, David M.; Wells, Garth; Qureshi, Aqeel A.; Jacobs, Michael et al. (2019). Low-Profile Artificial Grid Dielectric Resonator Antenna Arrays for mm .... IEEE Transactions on Antennas and Propagation 67(7) , 1-1. 10.1109/tap.2019.2907610.