News: SyLMAND Beamline/FacilityPosted on March 13, 2017
SyLMAND is now offering both X-ray and UV lithography. UV laser patterning of resist is usually used at SyLMAND for primary patterning of X-ray masks. The UV patterning can also be used as a stand alone technology for patterning of thn films and rapid prototyping using UV sensitive photoresists. Several different resist technologies are available including SU-8 negative resist, AZ1500 series positive resist and and Ma-N 1400 series negative photoresist suitable for lift-off.
SyLMAND is a Beamline/Facility that utilizes X-ray and UV lithography to fabricate micro structured devices.
The Synchrotron Laboratory for Micro and Nano Devices (SyLMAND) beamline is Canada’s only x-ray lithography beamline and is located at the Canadian Light Source (CLS) in Saskatoon, Canada. The beamline and supporting labs are housed in a Class 10 000 cleanroom. SyLMAND offers complete X-ray and UV lithography processing capabilities and advanced metrology to academic and industrial users. SyLMAND employs two full-time scientists with expertise in processing technologies and applications including RF MEMS, x-ray optics, biomedical device fabrication, microfluidics, and devices for analytical spectroscopy.
- Flaman, Grace T.; Boyle, Nicole D.; Vermelle, Cyprien; Morhart, Tyler A.; Ramaswami, Bdhanya et al. (2023). Chemical Imaging of Mass Transport Near the No-Slip Interface of a Microfluidic Device using Attenuated Total Reflection–Fourier Transform Infrared Spectroscopy. Analytical Chemistry 95(11) , 4940-4949. 10.1021/acs.analchem.2c04880.
- Morhart, Tyler A.; Tu, Kaiyang; Read, Stuart T.; Rosendahl, Scott M.; Wells, Garth et al. (2022). Surface enhanced infrared spectroelectrochemistry using a microband electrode. Canadian Journal of Chemistry 100(7) . 10.1139/cjc-2021-0183.
- Joly, Maxime; Deng, Tianyang; Morhart, Tyler A.; Wells, Garth; Achenbach, Sven et al. (2021). Scanning Aperture Approach for Spatially Selective ATR-FTIR Spectroscopy: Application to Microfluidics. Analytical Chemistry 93(42) . 10.1021/acs.analchem.1c01614.