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    News: SyLMAND Beamline/Facility

    Posted on March 13, 2017
    SyLMAND is now offering both X-ray and UV lithography.  UV laser patterning of resist is usually used at SyLMAND for primary patterning of X-ray masks.  The UV patterning can also be used as a stand alone technology for patterning of thn films and rapid prototyping using UV sensitive photoresists.  Several different resist technologies are available including SU-8 negative resist, AZ1500 series positive resist and and Ma-N 1400 series negative photoresist suitable for lift-off.

SyLMAND is a Beamline/Facility that utilizes X-ray and UV lithography to fabricate micro structured devices.

The Synchrotron Laboratory for Micro and Nano Devices (SyLMAND) beamline is Canada’s only x-ray lithography beamline and is located at the Canadian Light Source (CLS) in Saskatoon, Canada. The beamline and supporting labs are housed in a Class 10 000 cleanroom. SyLMAND offers complete X-ray and UV lithography processing capabilities and advanced metrology to academic and industrial users. SyLMAND employs two full-time scientists with expertise in processing technologies and applications including RF MEMS, x-ray optics, biomedical device fabrication, microfluidics, and devices for analytical spectroscopy.




List of Publications »

  • Atkinson, Noah; Morhart, Tyler A.; Wells, Garth; Flaman, Grace T.; Petro, Eric et al. (2023). Microfabrication Process Development for a Polymer-Based Lab-on-Chip Concept Applied in Attenuated Total Reflection Fourier Transform Infrared Spectroelectrochemistry. Sensors 23(14) , 6251. 10.3390/s23146251.
  • Tony, Anthony; Badea, Ildiko; Yang, Chun; Liu, Yuyi; Wells, Garth et al. (2023). The Additive Manufacturing Approach to Polydimethylsiloxane (PDMS) Microfluidic Devices: Review and Future Directions. Polymers 15(8) , 1926. 10.3390/polym15081926.
  • Flaman, Grace T.; Boyle, Nicole D.; Vermelle, Cyprien; Morhart, Tyler A.; Ramaswami, Bdhanya et al. (2023). Chemical Imaging of Mass Transport Near the No-Slip Interface of a Microfluidic Device using Attenuated Total Reflection–Fourier Transform Infrared Spectroscopy. Analytical Chemistry 95(11) , 4940-4949. 10.1021/acs.analchem.2c04880.