• News

  • SyLMAND Beamline/Facility Image

    News: SyLMAND Beamline/Facility

    Posted on March 13, 2017
    SyLMAND is now offering both X-ray and UV lithography.  UV laser patterning of resist is usually used at SyLMAND for primary patterning of X-ray masks.  The UV patterning can also be used as a stand alone technology for patterning of thn films and rapid prototyping using UV sensitive photoresists.  Several different resist technologies are available including SU-8 negative resist, AZ1500 series positive resist and and Ma-N 1400 series negative photoresist suitable for lift-off.


SyLMAND is a Beamline/Facility that utilizes X-ray and UV lithography to fabricate micro structured devices.

The Synchrotron Laboratory for Micro and Nano Devices (SyLMAND) beamline is Canada’s only x-ray lithography beamline and is located at the Canadian Light Source (CLS) in Saskatoon, Canada. The beamline and supporting labs are housed in a Class 10 000 cleanroom. SyLMAND offers complete X-ray and UV lithography processing capabilities and advanced metrology to academic and industrial users. SyLMAND employs two full-time scientists with expertise in processing technologies and applications including RF MEMS, x-ray optics, biomedical device fabrication, microfluidics, and devices for analytical spectroscopy.