News:
SyLMAND Beamline/Facility
Posted on March 13, 2017
SyLMAND is now offering both X-ray and UV lithography. UV laser patterning of resist is usually used at SyLMAND for primary patterning of X-ray masks. The UV patterning can also be used as a stand alone technology for patterning of thn films and rapid prototyping using UV sensitive photoresists. Several different resist technologies are available including SU-8 negative resist, AZ1500 series positive resist and and Ma-N 1400 series negative photoresist suitable for lift-off.
